Zentrum für angewandte Forschung
Institut für Präzisionsbearbeitung und Hochfrequenztechnik - Technologie Campus Teisnach
Operative Leitung
Operativer Leiter der Technologie Campus Teisnach Optik
Montag - Donnerstag / Technologie Campus Teisnach T002 / 07:00 - 16:00 Freitag / Fakultät NuW L002 / 07:00 - 13:00
Analysis of residual errors during computer controlled polishing
In: EOS Optical Technologies: Conference on Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 7: Plenary Session
World of Photonics Congress München
ABC-polishing
pg. 1082906.
DOI: 10.1117/12.2318549
Tilted wave interferometry for testing large surfaces
pg. 1082908.
DOI: 10.1117/12.2318573
Model based error separation of power spectral density artefacts in wavefront measurement
In: SPIE Optical Engineering + Applications Conference on Interferometry XIX
San Diego, CA, USA
Model based error separation of power spectral density artefacts in wavefront measurement
pg. 107490T.
DOI: 10.1117/12.2321106
Contribution of the phase transfer function of extended measurement cavities to mid spatial frequencies and the overall error budget
pg. 108290L.
DOI: 10.1117/12.2318711
Polishing tool and the resulting TIF for three variable machine parameters as input for the removal simulation
pg. 1032602.
DOI: 10.1117/12.2267415
Contribution of the phase transfer function of extended measurement cavities to mid spatial frequencies and the overall error budget
In: Fifth European Seminar on Precision Optics Manufacturing
Teisnach
Yet one more dwell time algorithm
pg. 1032606.
DOI: 10.1117/12.2270540
Surface errors in the course of machining precision optics
pg. 95750O.
DOI: 10.1117/12.2189991